Dear Maksym, Based on my own experience, you may have the problem due to the following reasons: 1. PR features are probably narrow, so that BOE kind of lifts-off the narrow PR features. 2. BOE etch time is too long for the width of your PR features. I assume that you are using an adhesion promoter before spinning PR. I hope this helps... Sincerely, Mehmet On Jun 9, 2016 9:55 PM, "Maksym Plakhotnyuk"wrote: > Hi All > > I face a problem of keeping AZ5214e photoresist on top of Al2O3 film > during BHF etch. > I have done post bake of PR at 150C for 30 min however it still does not > help. > Does any of you know the solution or any idea how to keep PR On top of > alumina during BHF etch? > > Thank you in advance > > Best regards > Maksym Plakhotnyuk > PHD student at DTU > > > _______________________________________________ > Hosted by the MEMS and Nanotechnology Exchange, the country's leading > provider of MEMS and Nanotechnology design and fabrication services. > Visit us at http://www.mems-exchange.org > > Want to advertise to this community? See http://www.memsnet.org > > To unsubscribe: > http://mail.mems-exchange.org/mailman/listinfo/mems-talk > _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk