Did you bake the wafers and apply HMDS (adhesion promoter) before applying the
photoresist?    --Kirt Williams


      From: Maksym Plakhotnyuk 
 To: mems-talk@memsnet.org
 Sent: Wednesday, June 8, 2016 10:43 AM
 Subject: [mems-talk] AZ5214E photoresist adhesion problem on Al2O3 coated Si
wafers

Hi All

I face a problem of keeping AZ5214e photoresist on top of Al2O3 film during BHF
etch.
I have done post bake of PR at 150C for 30 min however it still does not help.
Does any of you know the solution or any idea how to keep PR On top of alumina
during BHF etch?

Thank you in advance

Best regards
Maksym Plakhotnyuk
PHD student at DTU


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