Dear Sir, Reduce post bake temperature less than 150C (90-110C) and try few more times. On Wed, Jun 8, 2016 at 11:13 PM, Maksym Plakhotnyukwrote: > Hi All > > I face a problem of keeping AZ5214e photoresist on top of Al2O3 film > during BHF etch. > I have done post bake of PR at 150C for 30 min however it still does not > help. > Does any of you know the solution or any idea how to keep PR On top of > alumina during BHF etch? > > Thank you in advance > > Best regards > Maksym Plakhotnyuk > PHD student at DTU > > > _______________________________________________ > Hosted by the MEMS and Nanotechnology Exchange, the country's leading > provider of MEMS and Nanotechnology design and fabrication services. > Visit us at http://www.mems-exchange.org > > Want to advertise to this community? See http://www.memsnet.org > > To unsubscribe: > http://mail.mems-exchange.org/mailman/listinfo/mems-talk > -- Thanks & Best Regards, *KarthiKeyan K* *[image: cid:image003.png@01CEA577.52CA8B60] P**lease consider the environment before printing **this email - Save Trees, Save our Planet Earth !!! *
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_______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk